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October 15, 1967Applied Physics Letters

SIMPLE TECHNIQUE FOR VERY THIN SiO2 FILM THICKNESS MEASUREMENTS

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WPW. A. PliskinIBM (United States)RER. P. EschRite-Solutions (United States)

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Pliskin et al. (1967) studied this question.

synapsesocial.com/papers/6a897b785edafe343d92e1efhttps://doi.org/10.1063/1.1755124
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  1. 1Refractive Index of SiO2 Films Grown on Silicon1965 · 55 citations