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March 1, 1975Journal of The Electrochemical SocietyOpen Access

Oxide Growth on Etched Silicon in Air at Room Temperature

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SRS. I. RaiderIBM Research - Thomas J. Watson Research CenterRFR. FlitschIBM (United States)MPMaghmood PalmerCape Peninsula University of Technology

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Raider et al. (1975) studied this question.

synapsesocial.com/papers/6a897bbb5246293882fd48e4https://doi.org/10.1149/1.2134225
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