A review of techniques for electrical measurement of high current ion beams is presented. A computer analysis of the secondary-particle current-collection schemes is made for dosimetry-cup configurations commonly used on ion implanters with electrostatic scanning. The design of a dosimetry cup for a high current implanter with mechanical scanning is discussed. Also beam monitoring techniques for uniformity measurements are reviewed.
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C.M. McKenna (1979) studied this question.
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