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January 1, 2002Journal of The Electrochemical SocietyOpen Access

Chemical Vapor Deposition of HfOsub 2 Thin Films Using a Novel Carbon-Free Precursor: Characterization of the Interface with the Silicon Substrate

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JPJaehoo ParkSeoul National UniversityBPByoung Keon ParkSeoul National UniversityMCMoonju ChoMicron (United States)

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Park et al. (2002) studied this question.

synapsesocial.com/papers/6a8a823e186271ac9933685chttps://doi.org/10.1149/1.1425798
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