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October 1, 1986Journal of Applied Physics

Investigation of the growth kinetics of glow-discharge hydrogenated amorphous silicon using a radical separation technique

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AMAkihisa MatsudaNippon Medical SchoolKTKazunobu TanakaThe University of Osaka

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Matsuda et al. (1986) studied this question.

synapsesocial.com/papers/6a8a86efe0083a7c2c437e0fhttps://doi.org/10.1063/1.337144
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