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Optical emission spectroscopy and mass spectrometry have been employed as diagnostic tools for studying the glow discharge plasma of pure SiH 4 and pure Si 2 H 6 . It has been suggested that the dimeric species play an important role in the deposition of a-Si: H from Si 2 H 6 glow discharge in contrast to the monomeric species of SiH dominant in the deposition from pure SiH 4 . A large amount of hydrogen which is not bonded with Si is incorporated in a-Si: H films prepared from Si 2 H 6 and this might be reflected in the dark and photoconductivity of the films.
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Matsuda et al. (1983) studied this question.
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