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July 1, 1989Journal of Applied Physics

Spatial profiles of reactive intermediates in rf silane discharges

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DMD. MatarasUniversity of PatrasSCS. CavadiasChimie ParisTechDRDimitrious E. RapakouliasChimie ParisTech

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Mataras et al. (1989) studied this question.

synapsesocial.com/papers/6a70969af44fa9f079de415chttps://doi.org/10.1063/1.343915
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