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February 1, 1989Japanese Journal of Applied Physics

Diffusion Coefficient and Reaction Rate Constant of the SiH3 Radical in Silane Plasma

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Authors

NINaoshi ItabashiHitachi (United Kingdom)KKKozo KatoNagoya UniversityNNNobuki NishiwakiNagoya University

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Itabashi et al. (1989) studied this question.

synapsesocial.com/papers/6a70969af44fa9f079de415ehttps://doi.org/10.1143/jjap.28.l325
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