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August 1, 1988Japanese Journal of Applied Physics

Measurement of the SiH3 Radical Density in Silane Plasma using Infrared Diode Laser Absorption Spectroscopy

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Authors

NINaoshi ItabashiHitachi (United Kingdom)KKKozo KatoNagoya UniversityNNNobuki NishiwakiNagoya University

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Itabashi et al. (1988) studied this question.

synapsesocial.com/papers/6a70969af44fa9f079de4161https://doi.org/10.1143/jjap.27.l1565
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