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January 1, 2000Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Plasma abatement of perfluorocompounds in inductively coupled plasma reactors

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Authors

XXXudong XuBeijing Institute of TechnologySRShahid RaufApplied Materials (United States)MKMark J. KushnerUniversity of Michigan

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Xu et al. (2000) studied this question.

synapsesocial.com/papers/6a8bc2c8c12eaf65c8b21722https://doi.org/10.1116/1.582138
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