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November 1, 1997Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Kinetics of F atoms and fluorocarbon radicals studied by threshold ionization mass spectrometry in a microwave CF4 plasma

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Authors

ATA. TserepiNational Centre of Scientific Research "Demokritos"WSW. SchwarzenbachSoitec (France)JDJacques DerouardLaboratoire Interdisciplinaire de Physique

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Tserepi et al. (1997) studied this question.

synapsesocial.com/papers/6a95bc19fbedde85bb420c3bhttps://doi.org/10.1116/1.580855
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