Synapse
⌘+K
Synapse
PulseExploreClubsResearchersJournals
Instagram
HomeClubsExplore
April 1, 1967Applied Physics Letters

Reactively Sputtered Vanadium Dioxide Thin Films

View Full Paper
Ask AI
Bookmark
Share

Authors

EFE.N. FulsAT&T (United States)DHD. H. HenslerOrthopaedic Research LaboratoriesARAmy R. RossLos Alamos National Laboratory

Discussion

Loading...

Member takes

Implication

Key Points

Key points are not available for this paper at this time.

Cite This Study

Fuls et al. (1967) studied this question.

synapsesocial.com/papers/6a8d0bf552f536cb0a1cd228https://doi.org/10.1063/1.1754909
View Full Paper
Ask AI
Bookmark
Share

Also Consider

Synapse has enriched 4 closely related papers on similar clinical questions. Consider them for comparative context:

  1. 1Temperature Coefficients of Resistance of Metallic Films in the Temperature Range 25° to 600°C1959 · 140 citations
  2. 2Deposition of Tantalum, Tantalum Oxide, and Tantalum Nitride with Controlled Electrical Characteristics1966 · 55 citations
  3. 3Effects of Nitrogen, Methane, and Oxygen on Structure and Electrical Properties of Thin Tantalum Films1964 · 179 citations
  4. 4Electrical Resistances of Thin Metal Films before and after Artificial Aging by Heating1957 · 51 citations