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February 1, 1980Journal of Applied Physics

Silicon molecular beam epitaxy with simultaneous ion implant doping

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YOYusuke OtaThe University of Tokyo

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Yusuke Ota (1980) studied this question.

synapsesocial.com/papers/6a901a12ebb21526730d331fhttps://doi.org/10.1063/1.327717
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