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October 1, 1979Journal of The Electrochemical SocietyOpen Access

n‐Type Doping Techniques in Silicon Molecular Beam Epitaxy by Simultaneous Arsenic Ion Implantation and by Antimony Evaporation

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YOYusuke OtaThe University of Tokyo

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Yusuke Ota (1979) studied this question.

synapsesocial.com/papers/6a901a8b2e3cec13db33c871https://doi.org/10.1149/1.2128792
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