Experimental study demonstrates enhanced fluid flow and low thermal resistance in patterned wickless vapor chambers, highlighting the value of condensation optimization for chip cooling.
The exponential increase in demand for artificial intelligence computing power has made chip heat dissipation a primary bottleneck limiting computing performance. To address the challenge of high heat flux dissipation in chips, this study utilizes a vapor chamber that leverages Laplace pressure, generated by surface wettability differences, to drive the movement of the internal working fluid. The investigation centers on bionic fishbone-like and feather-like unit patterns, designing four gas-liquid circulation modes by combining different pattern arrays and considering both condensation and evaporation limits. Visual flow analysis was performed on vapor chambers with hydrophilic-hydrophobic array surface combinations under heat loads from 0 to 70 W. The self-driven mechanism of the patterned pathways was elucidated through observations of liquid film thickness and flow morphology. The results demonstrate that the sample 4 featuring a divergent pattern on the evaporation and multi-point pattern on the condensation exhibited no liquid column formation at 70 W, and its vaporization height was reduced by 15.5% compared to the sample with a divergent evaporation pattern and centralized condensation. It confirm the superior thermal performance of the model 4 configuration (thermal resistance: 0.211 °C/W) and underscore the importance of optimizing condensation in the heat transfer design of vapor chambers.
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Luo et al. (2026) studied this question.
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