Optical Constants of CVD-SiC Mirrors Produced by Different Processes from 200 to 1000 eV

The optical constants of seven CVD-SiC mirrors produced by different processes have been measured in the soft X-ray region (200-1000 eV) by means of the reflectance method. In spite of the difference in the production process, no dependence of the optical constants on the samples was found. The photon-energy dependence of the optical constants for CVD-SiC is represented in terms of power formulas over a range of 300-1000 eV. It is also found that the rms surface roughness estimated by the reflectance method is always larger than the value measured with a WYKO optical profilometer.