We applied the technique of ammonium sulfide treatment to Al x Ga1-x As (110) surfaces and investigated the atomic composition of a surface by Auger electron spectroscopy and X-ray photoelectron spectroscopy. It was found that surface oxidation was significantly reduced by the sulfur treatment and that sulfur atoms were mainly bonded to Al atoms in an Al-enriched sample of Al x Ga1-x As (x=0.78). The surface compositions of the Al-enriched specimen (x=0.43, 0.78) were also found to be As-riched as a result of both sulfur treatment and the preferential etching of metallic atoms by an acidic solution, which prevents the initial oxidation of the surface of Al x Ga1-x As.
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Ohno et al. (1990) studied this question.
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