Experimental results on changes in conductivity of N2+ and Ar+ bombarded thin copper, aluminium and bismuth films are given along with the preliminary observations on photoconductivity of N2+ bombarded Bi2O3 thin films. The performance of a low cost, medium resolution 200 keV ion implantation system, used in the above experiments is also discussed.
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Ogale et al. (1982) studied this question.
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