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January 1, 1988Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

Electrical damage induced by ion beam etching of GaAs

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Authors

ASAxel SchererCalifornia Institute of TechnologyHCH. G. CraigheadCornell UniversityMRM. L. RoukesCalifornia Institute of Technology

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Cite This Study

Scherer et al. (1988) studied this question.

synapsesocial.com/papers/6a94652b5e508145153eda65https://doi.org/10.1116/1.584023
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