InGaN lattice constant engineering via growth on (In,Ga)N/GaN nanostripe arrays

Planar (In,Ga)N layers were grown on nanostripe arrays composed of InGaN/GaN multi quantum wells (MQWs) by metal–organic chemical vapor deposition. The MQW nanostripe arrays with height to width aspect ratios of about 0.5 and 1 were fabricated from planar coherently strained InGaN/GaN MQW samples. Independent of their aspect ratio, the nanostripes exhibited elastic relaxation perpendicular to the stripe direction after pattern fabrication, resulting in an a ⊥ lattice constant perpendicular to the stripe direction larger than that of the GaN base layer. In a subsequent step, (In,Ga)N layers were grown on top of the nanostripe arrays, leading to the formation of planar films with a similar a ⊥ lattice constant as the MQW stripes beneath. Bright luminescence was recorded from the planar, partially relaxed re-grown (In,Ga)N layers grown on the stripe arrays with an aspect ratio of 1. Plastic relaxation of the MQW stripes was observed after (In,Ga)N regrowth for samples with a stripe aspect ratio of 0.5, leading to luminescence quenching.