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April 19, 2012Applied Physics Express

Effect of Hydrogen Reduction on Characteristics of Cu Thin-Films Deposited by RF-Driven Ar/H₂ Atmospheric Pressure Plasma Jet

Hisashi Nakahiro Peng Zhao Akihisa Ogino Wei Zheng Yuedong Meng Masaaki Nagatsu

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Abstract

Effect of Hydrogen Reduction on Characteristics of Cu Thin-Films Deposited by RF-Driven Ar/H2 Atmospheric Pressure Plasma Jet, Nakahiro, Hisashi, Zhao, Peng, Ogino, Akihisa, Zheng, Wei, Meng, Yuedong, Nagatsu, Masaaki

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Nakahiro et al. (2012) studied this question.

synapsesocial.com/papers/6a984aa34205d9805415f504 https://doi.org/10.1143/apex.5.056201

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