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May 1, 1989Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Plasma characterization for a divergent field electron cyclotron resonance source

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Authors

JFJohn ForsterIBM (United States)WHW. M. HolberQuality and Reliability (Greece)

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Forster et al. (1989) studied this question.

synapsesocial.com/papers/6a9ac26ccc0ca3339d0e6293https://doi.org/10.1116/1.575817
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