Surface engineering of P(VDF-TrFE) thin films: Impact of deposition parameters on topographical homogeneity, morphology and ferroelectric switching

Preparing electroactive polymer on transparent electrode surfaces presents a fascinating set of trade-offs between superior electrical performance and significant processing hurdles. While the deposition of polymeric thin films onto electrode-functionalized substrates is often perceived as a routine procedure, achieving the interfacial homogeneity necessary for a high-fidelity ferroelectric response remains a non-trivial challenge. The spin-coating process is governed by a complex fluid-dynamic regime balancing centrifugal forces, solution rheology, and solvent evaporation kinetics. Sub-optimal control of these mechanisms often induces surface curvature, thickness gradients, and undesirable microstructural porosity. In this study, we systematically delineate the role of critical processing vectors specifically layer count, solution molarity, angular velocity, and post-deposition thermal treatment in tailoring the morphology and domain-switching kinetics of poly(vinylidene fluoride-co-trifluoroethylene) [P(VDF-TrFE)] thin films. Consequently, it provides a robust framework for integrating high-performance P(VDF-TrFE) thin films into the next generation of flexible, large-area organic electronics and neuromorphic computing architecture.