What question did this study set out to answer?

To examine the reaction mechanisms and product distribution of silicon interacting with molecular chlorine alone and under simultaneous argon ion bombardment.

April 1, 1984Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Ion-assisted etching of silicon by molecular chlorine

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To examine the reaction mechanisms and product distribution of silicon interacting with molecular chlorine alone and under simultaneous argon ion bombardment.
Exposed silicon targets to molecular chlorine alone and concurrently with an argon ion beam across various target temperatures and ion energies.
Characterized reaction products and kinetic properties using mass spectrometry and time-of-flight techniques.
Thermal reaction alone produced predominantly silicon tetrachloride (SiCl4) at low temperatures and silicon dichloride (SiCl2) at elevated temperatures.
Combined ion beam and chlorine exposure yielded atomic silicon, atomic chlorine, and molecular SiCl and SiCl2 in comparable orders of magnitude.
Reaction products under combined exposure originated predominantly from direct sputtering of a heavily chlorinated surface layer rather than ion-stimulated thermal pathways.

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Implication

Experimental study reveals sputtering drives product ejection during ion-assisted silicon etching by chlorine, suggesting surface halogenation enables low-energy atomic removal.

Cite This Study

Sanders et al. (1984) studied this question.

synapsesocial.com/papers/6a9c503df6543b4c8b88163e https://doi.org/10.1116/1.572601

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Implication

Experimental study reveals sputtering drives product ejection during ion-assisted silicon etching by chlorine, suggesting surface halogenation enables low-energy atomic removal.

Ion-assisted etching of silicon by molecular chlorine

Key Points

Discussion

Implication

Cite This Study

Ion-assisted etching of silicon by molecular chlorine

Key Points

Discussion

Implication

Cite This Study

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