New fluorine-containing organosilicon oligomers, RF(CH2CHSiR3)xRF{x= 2 or 3, RF= C3F7 or CF(CF3)[OCF2CF(CF3)]YOC3F7, y= 0 or 1; R = OMe or Me} were obtained by the reactions of fluoroalkanoyl peroxides with the corresponding vinylsilanes in excellent to moderate yields under very mild conditions.
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Hideo Sawada (1991) studied this question.
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