Fabrication of Low Line Edge Roughness Mold by Spin On Glass (SOG) Replica Method

This paper reports on the fabrication of a low line edge roughness (LER) mold by the spin on glass (SOG) replica method. The fabrication technique provides a transparent mold with a low LER. In the mold fabrication, the combination of a low LER Si master mold made by anisotropic wet etching and the SOG replica process is effective in reducing fluctuation of the transparent mold pattern. Using this method, we could obtain an LER of SOG replica mold as low as 0.80 nm. When this SOG replica mold was used for photo-nanoimprint, the LER of the patterns on the photocurable polymer, used for the process, was found to be 0.86 nm which is considered quite comparable to the LER of the patterns on the Si master mold. Moreover, using the SOG replica mold, we also nanoimprinted a 60 nm line and space (L/S) pattern with an aspect ratio of 2 and 30 nm L/S patterns.