Synapse
⌘+K
Synapse
PulseExploreClubsResearchersJournals
Instagram
HomeClubsExplore
July 1, 1986Japanese Journal of Applied PhysicsOpen Access

MoO3 Electron Resist and Its Application to Fabrication of Mo Fine Pattern

View Full Paper
Ask AI
Bookmark
Share

Authors

FKFusayoshi KumadaIwate UniversityMOMasaaki OkamotoHiroshima UniversityMBMamoru BabaIwate University

Discussion

Loading...

Member takes

Implication

Key Points

Key points are not available for this paper at this time.

Cite This Study

Kumada et al. (1986) studied this question.

synapsesocial.com/papers/6a9e9b1c070195defe61e47ehttps://doi.org/10.1143/jjap.25.l574
View Full Paper
Ask AI
Bookmark
Share

Also Consider

Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context:

  1. 1Crystallographic shear in molybdenum trioxide1969 · 93 citations
  2. 2A New Inorganic Electron Resist Using Amorphous WO3 Film1981 · 32 citations
  3. 3Ion-Beam Modification of Amorphous WO3 Film and Its Properties as a High-Contrast Inorganic Ion Resist1985 · 21 citations
  4. 4A new inorganic electron resist of high contrast1977 · 82 citations
  5. 5A novel inorganic photoresist utilizing Ag photodoping in Se-Ge glass films1976 · 105 citations