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November 1, 1990Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

A novel electron-beam exposure technique for 0.1-μm T-shaped gate fabrication

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Authors

NSN. SamotoAssociation of Super-Advanced ElectronicsYMYoichi MakinoRitsumeikan UniversityKOK. OndaNEC (Japan)

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Cite This Study

Samoto et al. (1990) studied this question.

synapsesocial.com/papers/6a9fca0d4e3da7c164efd434https://doi.org/10.1116/1.584914
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