Recent Progress of Liquid Source Misted-Chemical Deposition System for Ferroelectric Materials

This paper presents the advanced Liquid Source Misted Chemical Deposition (LSM-CD) system equipped with a new atomizer and a refiner with ultrasonic vibration (USV). This system has been developed based on conventional LSM-CD system having 2–3 μm mist droplets for ferroelectric thin film deposition. Fine mist droplets less than 0.2 μm in mean diameter were obtained, then PZT thin films ware deposited on Pt/TiO2/SiO2/Si substrates by this system. As a result, the excellent values of 2 Pr and 2 Ec of the film were 62 μC/cm2 and 120 KV/cm for a 100 nm in thickness respectively. Moreover, in an attempt to fill up PZT into a trench (0.8 μm wide & 1.3 μm depth) substrate, the excellent gap-fill properties were obtained.