Development of a Sessile Drop Method Concerning Czochralski Si Crystal Growth

A sessile drop method for the measurement of the oxygen dissolution rate from silica glass to silicon melt proposed previously has been further developed. The main error in the measurement was the weight loss of the silica plate itself because of the reaction between the silica plate and the carbon crucible. A pyrolytic boron nitride (PBN) plate was placed between the silica plate and carbon crucible, and results showed that the error was reduced effectively using the protective PBN plate. As an application of the sessile drop method, the effect of OH content in different silica materials on the oxygen dissolution rate was also investigated. There was no evident difference in the dissolution rate from the different kinds of silica materials with different OH concentrations.