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August 1, 1980Journal of The Electrochemical SocietyOpen Access

The Growth and Characterization of Very Thin Silicon Dioxide Films

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Authors

AAA. C. AdamsUniversity of Central FloridaTST. E. SmithUniversity of New HampshireCCC. C. ChangUniversity of Oxford

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Cite This Study

Adams et al. (1980) studied this question.

synapsesocial.com/papers/6aa42737037baa32b3556755https://doi.org/10.1149/1.2130002
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