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November 1, 1993Journal of The Electrochemical SocietyOpen Access

Film Properties of CVD Titanium Nitride Deposited with Organometallic Precursors at Low Pressure Using Inert Gases, Ammonia, or Remote Activation

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AIA. Intemann HKHeinrich Koerner FKF. KochOak Ridge National Laboratory

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Intemann et al. (1993) studied this question.

synapsesocial.com/papers/6aa6252d89092379003a63ab https://doi.org/10.1149/1.2221013

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