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The methods of synthesis of interstitial phase films (transition metal carbide, nitride, boride, and hydride films) are described. Different versions of their chemical and physical deposition from the gas phase are compared and discussed. The available information about the structures, electronic structures, and physicochemical properties of the films (including alloyed and multilayer films) is surveyed and analysed. The bibliography includes 225 references.
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Р. А. Андриевский (1997) studied this question.
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