Studies of film deposition in fluorocarbon plasmas employing a small gap structure

Ling Zheng; Ling Li; Xuefeng Hua; G. S. Oehrlein; Eric A. Hudson

doi:10.1116/1.1931680

July 1, 2005Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Studies of film deposition in fluorocarbon plasmas employing a small gap structure

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Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation Ling Zheng, Li Ling, Xuefeng Hua, Gottlieb S. Oehrlein, E. A. Hudson; Studies of film deposition in fluorocarbon plasmas employing a small gap structure. J. Vac. Sci. Technol. A 1 July 2005; 23 (4): 634–642. https://doi.org/10.1116/1.1931680 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAVS: Science & Technology of Materials Interfaces and ProcessingJournal of Vacuum Science & Technology A Search Advanced Search |Citation Search

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synapsesocial.com/papers/6aa6cc3f5175d8ad943992a7 https://doi.org/10.1116/1.1931680

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