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March 1, 1980Journal of Applied Physics

Silicide formation in thin cosputtered (tantalum + silicon) films on polycrystalline silicon and SiO2

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Authors

SMS. P. MurarkaRensselaer Polytechnic InstituteDFD. B. FraserIntel (United States)

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Murarka et al. (1980) studied this question.

synapsesocial.com/papers/6aa8f4e9598f9870ab512b9chttps://doi.org/10.1063/1.327814
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Also Consider

Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context:

  1. 1Silicide formation in thin cosputtered (titanium + silicon) films on polycrystalline silicon and SiO2.1980 · 131 citations
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