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March 1, 1997Japanese Journal of Applied Physics

Low Dielectric Constant Insulator Formed by Downstream Plasma CVD at Room Temperature Using TMS/O2

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Authors

ANAkiko NaraToshiba (Japan)HIHitoshi ItohTokai University Hospital

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Nara et al. (1997) studied this question.

synapsesocial.com/papers/6aa912bb556424ad646bf540https://doi.org/10.1143/jjap.36.1477
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