Microstructure and Preferred Orientation of Titanium Nitride Films Prepared by Laser CVD

Titanium nitride (TiNx: x=0.96–1.12) films were prepared by laser chemical vapor deposition (LCVD) using tetrakis-diethylamide-titanium (TDEAT) and ammonia (NH3) as source materials. The effects of deposition conditions, mainly total gas pressure (Ptot), laser power (PL) and pre-heating temperature (Tpre), on the composition, microstructure and preferred orientation of TiNx films were investigated. The N/Ti ratios (x) in TiNx films decreased with increasing Ptot and increased with Tpre at Ptot<400 Pa. The preferred orientation significantly depended on the Tpre and PL. (111) orientation was obtained at Tpre<673 K and Ptot<600 Pa, whereas (200) orientation appeared at Tpre>673 K and Ptot<600 Pa. The increase in PL caused the change from (200) to (111) orientation. With increasing Tpre, the TiNx films changed from a faceted texture with (111) orientation to a square texture with (200) orientation.