The current-voltage (I–V) characteristics of industrially fabricated, crystalline silicon solar cells are often influenced by non-linear shunts that originate from localized, highly disturbed regions and cause ideality factors n > 2. We show that recombination within such locations needs model descriptions that go beyond the Shockley-Read-Hall (SRH) approximation, because the density of defects is so high that recombination does not occur via isolated, but coupled defect states. We use a variant of coupled defect level (CDL) recombination, the donor-acceptor-pair (DAP) recombination, but via deep levels (as opposed to shallow levels). With this model, we quantitatively reproduce the I–V curves of solar cells that we subjected to various degrees of cleaving, laser scribing or diamond scratching to form shunt locations in a controlled manner. The suggested model explains the transition from ideality factors n < 2 to n > 2 when going from low to high defect densities. We also explain the non-saturating reverse I–V characteristics. We show that an additional source of currents with n > 2 is SRH recombination in an inversion layer that extends from the front p-n junction to the rear contact along the cell’s edge or along a micro-crack.
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Steingrube et al. (2011) studied this question.
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