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Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation Ming-Shu Kuo, Xuefeng Hua, G. S. Oehrlein, A. Ali, P. Jiang, P. Lazzeri, M. Anderle; Influence of C4F8/Ar-based etching and H2-based remote plasma ashing processes on ultralow k materials modifications. J. Vac. Sci. Technol. B 1 March 2010; 28 (2): 284–294. https://doi.org/10.1116/1.3308623 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAVS: Science & Technology of Materials Interfaces and ProcessingJournal of Vacuum Science & Technology B Search Advanced Search |Citation Search
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Kuo et al. (2010) studied this question.
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