Two Dimensional Fluid Model of RF Plasmas in SiH₄/Ar Mixtures

A self-consistent two dimensional numerical fluid model of rf plasmas under conditions close to those of the experiments for observing particle growth in silane rf plasmas has been developed. The geometry of the discharge chamber and the electrodes used in the model is cylindrically symmetric: two cylinders for the electrodes are surrounded by the grounded chamber. The rf plasmas are in SiH 4 (10%)/Ar(90%) at a pressure of 100 mTorr at 6.5 MHz. The results from the model, including the rf plasma structures and the generation rates for radicals, SiH, SiH 2 and SiH 3 , are presented. Effects of the applied rf voltage and the secondary electron emission coefficient on the generation rates of the radicals are discussed.