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August 2, 1993Applied Physics Letters

Two-dimensional hybrid model of inductively coupled plasma sources for etching

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Authors

PVPeter L. G. VentzekTokyo Electron (Japan)TSTimothy J. SommererGeneral Electric (United States)RHRobert J. HoekstraSandia National Laboratories California

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Ventzek et al. (1993) studied this question.

synapsesocial.com/papers/6a1b61710ea968f653abca46https://doi.org/10.1063/1.109963
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