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April 1, 1996Japanese Journal of Applied Physics

Metalorganic Chemical Vapor Deposition of Complex Metal Oxide Thin Films by Liquid Source Chemical Vapor Deposition

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Authors

PBPeter C. Van BuskirkSonata (United States)SBSteve BilodeauDanbury HospitalJRJeffrey F. RoederIBM (United States)

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Buskirk et al. (1996) studied this question.

synapsesocial.com/papers/6a6f7f3d35aa2c282ce0da9chttps://doi.org/10.1143/jjap.35.2520
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