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March 16, 1998Applied Physics Letters

Nitrogen plasma annealing for low temperature Ta2O5 films

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Authors

GAG. B. AlersUniversity of California, Santa CruzRFR. M. FlemingMurray State UniversityYWY. H. WongRutgers, The State University of New Jersey

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Alers et al. (1998) studied this question.

synapsesocial.com/papers/6a70123226a7f98052dc95ffhttps://doi.org/10.1063/1.120569
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