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December 1, 1990Journal of Applied Physics

Study of the structure in rf glow discharges in SiH4/H2 by spatiotemporal optical emission spectroscopy: Influence of negative ions

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FTFumiyoshi TochikuboTokyo Metropolitan UniversityASAkira SuzukiMatsuyama UniversitySKShigeru KakutaHitachi (Japan)

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Tochikubo et al. (1990) studied this question.

synapsesocial.com/papers/6a7095d331a3df824328d664https://doi.org/10.1063/1.347013
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