Low-threshold InGaAs/GaAs strained layer single quantum well lasers with simple ridge waveguide structure

Double heterostructure InGaAs-GaAs strained-layer single quantum well ridge waveguide lasers grown by molecular beam epitaxy were fabricated by using in situ laser monitored reactive ion etching to form the ridges. Continuous-wave threshold current as low as 3.5 mA was obtained on a ridge laser diode of 3.3 μm wide and 215 μm long having cleaved mirrors. The lasing wavelength is at 0.988 μm and the measured differential external quantum efficiency is 61%.