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Improved Electrical Characteristics of NO -Based Storage Dielectric by N2O Wet Oxidation and Postoxidation Treatment for Trench DRAM, Wu, Yung-Hsien, Wang, Chun-Yao, Chuang, Hwei-Lin, Kao, Tony, Chang, Ian, Kuo, Chia-Ming, Ku, Alex
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Wu et al. (2006) studied this question.
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