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August 1, 1984Japanese Journal of Applied Physics

Glow-Discharge Deposition of Amorphous Silicon from SiH3F

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Authors

AMAkihisa MatsudaNippon Medical SchoolKYKiyoshi YagiiTKTakao KagaElectrotechnical Institute

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Matsuda et al. (1984) studied this question.

synapsesocial.com/papers/6a8ae9cfe76aab33123373cehttps://doi.org/10.1143/jjap.23.l576
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  5. 5Preparations of a-Si:H from Higher Silanes (SinH2n+2) with the High Growth Rate1981 · 37 citations