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October 1, 1983Applied Physics Letters

Effect of thermal nitridation processes on boron and phosphorus diffusion in 〈100〉 silicon

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Authors

PFP. FaheyBaylor College of MedicineRDR.W. DuttonStanford UniversityMMMasoud MoslehiIsfahan University of Medical Sciences

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Fahey et al. (1983) studied this question.

synapsesocial.com/papers/6a8af87fc716e89f35decc4bhttps://doi.org/10.1063/1.94445
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  1. 1The effect of oxidation on the diffusion of phosphorus in silicon1979 · 83 citations
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  5. 5Nitridation of Silicon and Oxidized‐Silicon1982 · 121 citations