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August 1, 1980IEEE Transactions on Electron Devices

Application of line-edge profile simulation to thin-film deposition processes

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Authors

ANAndrew R. NeureutherUniversity of California, BerkeleyCTC. H. TingStanford UniversityCLChen-Yih Liu

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Neureuther et al. (1980) studied this question.

synapsesocial.com/papers/6a8cf2f8029556da77eaa5e9https://doi.org/10.1109/t-ed.1980.20055
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