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December 1, 1968IEEE Transactions on Electron Devices

Stress at the Si—SiO2interface and its relationship to interface states

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CLClyde H. LaneHanscom Air Force Base

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Clyde H. Lane (1968) studied this question.

synapsesocial.com/papers/6a90fb47c39ca0eda1830438https://doi.org/10.1109/t-ed.1968.16552
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